Sputtering targets and arc cathodes are employed in many areas of manufacturing for the production of thin films:

• Metallising (microelectronics, displays, optical data storage, photo masks, CIS solar cells)
• Diffusion barriers (microelectronics, plastic foils)
• Magnetic and opto-magnetic layers (magnetic and opto-magnetic data storage)
• Functional coatings on glass (heat and solar protective coatings, anti-reflection and anti-static coatings, switchable electrochromic glazing
• Hard-material coatings (tools, automotive and mechanical engineering components)
• Tribology coatings (tools, automotive and mechanical engineering components)
• Decorative coatings (Instruments, ornamental fittings, watches, spectacle frames)
• Optical coatings (opthalmics, fine optics, optoelectronics, lamp and headlamp reflectors)

Comprehensive know-how based on proprietary data combined with our knowledge of applications of high-performance materials allows PLANSEE to develop customer-specific target materials tailored to suit each individual application.

Advantages:

• High density and purity
• Superior sputtering properties in reactive and non-reactive coating modes
• Excellent homogeneity
• Large targets as a single piece

PLANSEE supplies:

• Targets and arc cathodes (bonded, clamped) for sputtering and arc evaporation
• Planar, tubular, customer-specific geometries