The implantation of ions is a key technology in the doping of Si wafers, in the manufacture of components in microelectronics and in thin film transistors. PLANSEE manufactures ionization chambers made of molybdenum or tungsten.

PLANSEE USA Supplies:

• Ionization chambers and chamber components made of W, WL or Mo
• Cathodes and anodes made of W
• Apertures and other components subject to wear in the chamber and the beam tunnel made of Mo and WL
• Connection and retention elements such as pins, gas pipes and screws, in Mo, W, WL or Ta
• Radiation shieldings / crucibles